The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 10, 2012

Filed:

Sep. 28, 2009
Applicant:

Hsin-hung Chuang, Taipei Hsien, TW;

Inventor:

Hsin-Hung Chuang, Taipei Hsien, TW;

Assignee:

Hon Hai Precision Industry Co., Ltd., Tu-Cheng, New Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exemplary method for manufacturing mechanical shutter blades using a beryllium-copper substrate is provided. The method includes providing a beryllium-copper alloy substrate having a first surface and a second surface opposite to the first surface; respectively applying a first and second photoresist layers onto the first and second surfaces; exposing and developing the first and second photoresist layers, thereby first portions of the first photoresist layer and second portions of the second photoresist layer are left on the first and second surfaces while an unwanted portion of the substrate is exposed to an exterior, the first portions are aligned with the second portions; removing the unwanted portion of the substrate using a wet etching process; and removing the first and second portions from the remaining portion of the substrate.


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