The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2012
Filed:
Oct. 20, 2009
Applicants:
Mahadevan Ganapathisubramanian, Austin, TX (US);
Byung-jin Choi, Austin, TX (US);
Mario Johannes Meissl, Austin, TX (US);
Inventors:
Mahadevan GanapathiSubramanian, Austin, TX (US);
Byung-Jin Choi, Austin, TX (US);
Mario Johannes Meissl, Austin, TX (US);
Assignee:
Molecular Imprints, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); B29D 17/00 (2006.01); B29C 59/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
System, method and process for imprinting a substrate using controlled deformation of a substrate and/or a template. The substrate and/or template may be positioned in single wave formation or double wave formation during an imprint lithography process.