The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2012
Filed:
Feb. 06, 2007
Jae Hwan Han, Seoul, KR;
Jae Hwan Han, Seoul, KR;
Frontics, Inc., , KR;
Abstract
Method for evaluating an asymmetric residual stress for a material by the indentation test comprises applying the residual stresses with an uniaxial and an symmetrical biaxial tensions on the material and then performing an instrumented indentation test indenting an asymmetric indenter on the material; and comparing a slope of indentation load-depth curve when the long diagonal direction of the asymmetric indenter is perpendicular to the direction of the largest residual stress with that in stress-free state, and then a slope of indentation load-depth curve when the long diagonal direction of the asymmetric indenter is parallel to the direction of the largest residual stress with that in stress-free state, so as to evaluate the asymmetric residual stress for the material.