The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2012

Filed:

Aug. 07, 2009
Applicants:

Chen-der Tsai, Hsinchu County, TW;

Wen-tung Hsu, Hsinchu County, TW;

Chin-jyi Wu, Kaohsiung, TW;

Chih-wei Chen, Taipei County, TW;

Inventors:

Chen-Der Tsai, Hsinchu County, TW;

Wen-Tung Hsu, Hsinchu County, TW;

Chin-Jyi Wu, Kaohsiung, TW;

Chih-Wei Chen, Taipei County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A casing is used for being rotatably disposed in a plasma jet system. The casing is rotated around a central axis. The casing comprises a main body and a plasma nozzle. The main body has a first cavity. The plasma nozzle is disposed under the main body and has a second cavity and a straight channel. The second cavity is connected to the first cavity. The straight channel is located at a side of the plasma nozzle opposite to the main body and connected to the second cavity. The straight channel has an extension axis which is substantially parallel with the central axis and separated from the central axis by an interval. Plasma generated by the plasma jet system jets out through the straight channel.


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