The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2012
Filed:
Jul. 29, 2009
Tooru Tanaka, Yokohama, JP;
Youhei Houtani, Ichihara, JP;
Atsushi Morita, Ichihara, JP;
Mitsui Chemicals, Inc., Minato-Ku, Tokyo, JP;
Abstract
Disclosed is a poly(4-methyl-1-pentene) resin composition having an excellent balance between micropore formability and toughness, which can sufficiently form fine pores by drawing and does not cause a break during drawing. The poly(4-methyl-1-pentene) resin composition contains 0-90 parts by mass of a 4-methyl-1-pentene homopolymer (A) and 10-100 parts by mass of a 4-methyl-1-pentene copolymer (B) having a structural unit derived from 4-methyl-1-pentene and a structural unit derived from a Cα-olefin other than 4-methyl-1-pentene. The content of the structural unit derived from a Cα-olefin other than 4-methyl-1-pentene is 0.1-2.1% by mass relative to the total amount of the homopolymer (A) and the copolymer (B). The poly(4-methyl-1-pentene) resin composition also contains 0.1-800 ppm of a nucleator (C) relative to the total weight of the homopolymer (A) and the copolymer (B).