The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2012
Filed:
Nov. 12, 2008
Hiroshi Morita, Tokyo, JP;
Hiromi Sato, Tokyo, JP;
Atsushi Kobayashi, Tokyo, JP;
Jinichi Omi, Tokyo, JP;
Seiichi Saito, Tokyo, JP;
Hiroshi Morita, Tokyo, JP;
Hiromi Sato, Tokyo, JP;
Atsushi Kobayashi, Tokyo, JP;
Jinichi Omi, Tokyo, JP;
Seiichi Saito, Tokyo, JP;
Adeka Corporation, Tokyo, JP;
Abstract
The present invention provides: a positive photosensitive composition that yields an insulation layer superior not only in high transparency, but also in heat resistance enduring a temperature during the production of a substrate, solvent resistance, and anti-aging property as a permanent resist; a positive permanent resist utilizing the positive photosensitive composition; and a method for producing the positive permanent resist. The present invention provides: a positive photosensitive composition containing (A) a curable silicone resin having a silanol group, which resin has a structure obtained by a reaction between one or more cyclic siloxane compounds represented by the following general formula (1): and one or more arylalkoxysilane compounds represented by the following general formula (2): (B) diazonaphthoquinones, and (C) a solvent; a positive permanent resist using the positive photosensitive composition; and a method for producing the positive permanent resist.