The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2012
Filed:
Dec. 29, 2011
Waltraud Werdecker, Hanau, DE;
Norbert Traeger, Maintal, DE;
Juergen Weber, Kleinostheim, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
SiOslurry for the production of quartz glass contains a dispersion liquid and amorphous SiOparticles with particle sizes to a maximum of 500 μm. The largest volume fraction is SiOparticles with particle sizes of 1 μm-60 μm, as well as SiOnanoparticles with particle sizes less than 100 nm constituting 0.2-15% volume by weight of the entire solids content. To prepare the slurry for use and optimize its flow behavior for later processing by dressing or pouring the slurry mass, and for later drying and sintering without cracks, the slurry has SiOparticles with a multimodal distribution of particle sizes, with a first maximum in the range 1 μm-3 μm and a second maximum in the range 5 μm-50 μm, and an 83%-90% solids content by weight of the SiOparticles and the SiOnanoparticles together.