The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2012

Filed:

Oct. 09, 2009
Applicants:

Thomas Sulzbach, Weisendorf, DE;

Oliver Krause, Erlangen, DE;

Mathieu Burri, Erlach, CH;

Manfred Detterbeck, Kreuzlingen, CH;

Bernd Irmer, München, DE;

Christian Penzkofer, München, DE;

Inventors:

Thomas Sulzbach, Weisendorf, DE;

Oliver Krause, Erlangen, DE;

Mathieu Burri, Erlach, CH;

Manfred Detterbeck, Kreuzlingen, CH;

Bernd Irmer, München, DE;

Christian Penzkofer, München, DE;

Assignee:

NanoWorld AG, Neuchâtel, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01Q 70/00 (2010.01);
U.S. Cl.
CPC ...
Abstract

A method of manufacturing an SPM probe having a support element, a cantilever, and a scanning tip on an underside of the cantilever, and having a mark located on the top side of the cantilever opposite the scanning tip. The mark on the top side of the cantilever is located exactly opposite the scanning tip on the underside of the cantilever. This makes it possible to identify the exact position of the scanning tip in the scanning probe microscope from the upward-pointing top side of the cantilever, which significantly simplifies the alignment of the SPM probe. The support element with the cantilever may be prefabricated conventionally and the scanning tip and the mark are then produced on the cantilever in a self-aligning way by means of a particle-beam-induced material deposition based on a gas-induced process.


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