The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2012
Filed:
Jun. 27, 2007
Quantifying a property of a focus computing resource based on proximity to other computing resources
Daniel H. Hardman, American Fork, UT (US);
Daniel H. Hardman, American Fork, UT (US);
Symantec Corporation, Mountain View, CA (US);
Abstract
The estimation of a risk factor applied to a negative potential of a focus computing resource based on proximity of the focus computing resource from other computing resources, and not just based on neighboring distance-1 computing resources. Upon determining that the risk factor applied to a negative potential of a focus computing resource is to be estimated, the negative potentials for one or more distance-1 computing resources are accessed. These negative potentials may have, in turn, been estimated based on distance and risk factor propagation from yet other higher distance computing resources. The negative potentials for the distance-1 computing resources are then used to estimate the risk factor applied to the negative potential of the focus computing resource.