The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2012
Filed:
Oct. 02, 2007
Keiichi Betsui, Yokohama, JP;
Shinya Fukuta, Yokohama, JP;
Tadayoshi Kosaka, Yokohama, JP;
Minoru Hasegawa, Fujisawa, JP;
Hajime Inoue, Yokohama, JP;
Yoshiho Seo, Yokohama, JP;
Tomonari Misawa, Yokohama, JP;
Keiichi Betsui, Yokohama, JP;
Shinya Fukuta, Yokohama, JP;
Tadayoshi Kosaka, Yokohama, JP;
Minoru Hasegawa, Fujisawa, JP;
Hajime Inoue, Yokohama, JP;
Yoshiho Seo, Yokohama, JP;
Tomonari Misawa, Yokohama, JP;
Hitachi, Ltd, Tokyo, JP;
Abstract
A technique for achieving both discharge voltage reduction and discharge stabilization in a PDP and the like is provided. This PDP manufacturing method includes, for a structure of a front plate structure () to be exposed to a discharge space () to be filled with a discharge gas, a step of forming a first layer () having an effect of discharge protective layer on a dielectric layer (), a step of forming a second layer () for protecting the first layer on the first layer, and a step of forming a third layer () of a powder for discharge stabilization to be exposed to the discharge space (), the steps being performed in vacuum manufacturing process. And, the structure is made such that a surface of the first layer is exposed to the discharge space () by a step of removing the second layer by an aging discharge in the discharge space ().