The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8207278 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 26, 2012

Filed:

Dec. 09, 2010
Applicants:

William Richard Russell, Miamisburg, OH (US);

John Anthony Schultz, Kettering, OH (US);

Inventors:

William Richard Russell, Miamisburg, OH (US);

John Anthony Schultz, Kettering, OH (US);

Assignee:

Dupont Electronic Polymers LP, Research Triangle Park, NC (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08G 59/16 (2006.01); C08G 59/17 (2006.01);
U.S. Cl.
CPC ...
Abstract

A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of:


Find Patent Forward Citations

Russell, William. (2012). Process for preparing stable photoresist compositions (U.S. Patent No. 8207278). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8207278

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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