The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2012
Filed:
May. 28, 2010
Masataka Kato, Hiratsuka, JP;
Kazuhiro Hayakawa, Kawasaki, JP;
Masataka Kato, Hiratsuka, JP;
Kazuhiro Hayakawa, Kawasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for manufacturing a substrate for a liquid discharge head provided with a silicon substrate and a supply port, including: providing the silicon substrate having an insulating layer on a first surface and an etching mask layer having a plurality of apertures on a second surface which is a rear surface of the first surface, wherein the insulating layer is provided in a region ranging from a position opposing the apertures to a position opposing a portion between the adjacent apertures of the mask layer; and forming holes by etching a silicon part of the silicon substrate so that an etched region reaches a portion of the insulating layer opposing the apertures, wherein the silicon wall provided between the adjacent holes is etched so that the portion in the first surface side thereof can be thinner than the portion in the second surface side thereof.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile