The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2012
Filed:
Dec. 15, 2009
Keren Jacobs Kanarik, Sunnyvale, CA (US);
Jorge Luque, Redwood City, CA (US);
Nicholas Webb, San Jose, CA (US);
Keren Jacobs Kanarik, Sunnyvale, CA (US);
Jorge Luque, Redwood City, CA (US);
Nicholas Webb, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for providing a process indicator for an etching chamber is provided. A wafer with a blanket etch layer is provided into the etching chamber. A blanket etch is performed on the blanket etch layer. A blanket deposition layer is deposited over the blanket etch layer after performing the blanket etch has been completed. A thickness of the blanket etch layer and a thickness of the blanket deposition layer is measured. The measured thicknesses are used to determine a process indicator.