The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2012

Filed:

Dec. 14, 2005
Applicants:

Yang Yang LI, Kowloon, HK;

Vijay S. Kollengode, La Mirada, CA (US);

Michael J. Sailor, La Jolla, CA (US);

Shawn O. Meade, San Diego, CA (US);

Inventors:

Yang Yang Li, Kowloon, HK;

Vijay S. Kollengode, La Mirada, CA (US);

Michael J. Sailor, La Jolla, CA (US);

Shawn O. Meade, San Diego, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J 13/02 (2006.01); B05B 5/00 (2006.01); A61K 9/50 (2006.01); A61K 9/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for forming photonic particles, where the method includes the steps of preparing a porous photonic material layer, patterning a soluble polymer on the porous photonic material layer, leaving dividing portions of the material layer untreated, infusing the polymer into the material layer, and removing the dividing portions of the material to obtain the photonic particles.


Find Patent Forward Citations

Loading…