The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2012
Filed:
Sep. 28, 2007
Megumi Fujimura, Saitama, JP;
Yasuo Hosoda, Saitama, JP;
Megumi Fujimura, Saitama, JP;
Yasuo Hosoda, Saitama, JP;
Pioneer Corporation, Tokyo, JP;
Abstract
An oxide material () is used as masking for patterning by etching which is performed with respect to a substrate or a material laminated on the substrate (). The oxide material is also used in a multi-step etching which is performed by using a resist () formed on the oxide material as a mask. The etching rate of the oxide material for a reaction gas containing an inert gas or hydrogen is higher than the etching rate of the resist for the reaction gas containing an inert gas or hydrogen, while the etching rate of the oxide material for a fluorine-containing gas is lower than the etching rate of the material, which is to be patterned by using the oxide material as a mask, for the fluorine-containing gas. In addition, the oxide material is soluble in a weak acid.