The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2012
Filed:
Jul. 13, 2011
John S. Lewis, Sunnyvale, CA (US);
Michael Biese, San Jose, CA (US);
Garrett H. Sin, San Jose, CA (US);
Chidambara A. Ramalingam, Santa Clara, CA (US);
Balaji Chandrasekaran, Santa Clara, CA (US);
Tak Fan (Kerry) Ling, Palo Alto, CA (US);
John S. Lewis, Sunnyvale, CA (US);
Michael Biese, San Jose, CA (US);
Garrett H. Sin, San Jose, CA (US);
Chidambara A. Ramalingam, Santa Clara, CA (US);
Balaji Chandrasekaran, Santa Clara, CA (US);
Tak Fan (Kerry) Ling, Palo Alto, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.