The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 19, 2012

Filed:

Jan. 02, 2008
Applicants:

Michiharu Yamamoto, Carlsbad, CA (US);

Peng Wang, Oceanside, CA (US);

Nasser Peyghambarian, Tucson, AZ (US);

Weiping Lin, Carlsbad, CA (US);

Inventors:

Michiharu Yamamoto, Carlsbad, CA (US);

Peng Wang, Oceanside, CA (US);

Nasser Peyghambarian, Tucson, AZ (US);

Weiping Lin, Carlsbad, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/29 (2006.01);
U.S. Cl.
CPC ...
Abstract

A photorefractive device () and method of manufacture are disclosed. The device () comprises a layered structure in which one or more polymer layers () are interposed between a photorefractive material () and at least one transparent electrode layer (). The layered structure is further interposed between a plurality of substrates (). When a bias is applied to the device (), the device () exhibits an increase in signal efficiency of approximately three to four times that of similar, but non-buffered, devices. Concurrently, the device () of the present disclosure utilizes approximately half the biased voltage, advantageously resulting in a longer device lifetime.


Find Patent Forward Citations

Loading…