The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2012
Filed:
Dec. 23, 2008
Applicants:
Gunn Choe, San Jose, CA (US);
Yoshihiro Ikeda, San Jose, CA (US);
Mohammad T. Mirzamaani, San Jose, CA (US);
Kai Tang, San Jose, CA (US);
Jinliu Wang, San Jose, CA (US);
Inventors:
Gunn Choe, San Jose, CA (US);
Yoshihiro Ikeda, San Jose, CA (US);
Mohammad T. Mirzamaani, San Jose, CA (US);
Kai Tang, San Jose, CA (US);
Jinliu Wang, San Jose, CA (US);
Assignee:
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/66 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method is described for improving recording performance of a perpendicular media. The method includes controlling the anisotropy levels in different sublayers of the magnetic recording layers of the perpendicular media. Further, the different sublayers thicknesses can be altered to match the media to a particular head.