The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 19, 2012

Filed:

Jul. 10, 2000
Applicants:

Rainer H. Müller, Berlin, DE;

Karsten Krause, Berlin, DE;

Karsten Mäder, Berlin, DE;

Inventors:

Rainer H. Müller, Berlin, DE;

Karsten Krause, Berlin, DE;

Karsten Mäder, Berlin, DE;

Assignee:

Abbott GmbH & Co., KG, Wiesbaden, DE;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K 9/10 (2006.01); A61K 9/14 (2006.01); A61K 9/51 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to superfine microparticles and nanoparticles and a process for their gentle preparation with exclusion of water or minimization of water and/or exclusion of plasticizers and/or reduced temperature load, in which a matrix material is subjected to a high-pressure homogenization process in an anhydrous or water-poor medium and/or at low temperatures, preferably room temperature (20° C.) and in particular below the freezing point of water, which leads to a gentle particle reduction with minimization of the impairment of the chemical stability of the homogenized material.


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