The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2012
Filed:
Jan. 26, 2009
Masaya Nakatani, Osaka, JP;
Soichiro Hiraoka, Osaka, JP;
Hiroshi Ushio, Osaka, JP;
Akiyoshi Oshima, Osaka, JP;
Hiroaki Oka, Osaka, JP;
Fumiaki Emoto, Ehime, JP;
Masaya Nakatani, Osaka, JP;
Soichiro Hiraoka, Osaka, JP;
Hiroshi Ushio, Osaka, JP;
Akiyoshi Oshima, Osaka, JP;
Hiroaki Oka, Osaka, JP;
Fumiaki Emoto, Ehime, JP;
Panasonic Corporation, Osaka, JP;
Abstract
A diaphragm is formed by etching a substrate. This substrate has a first surface provided with a depression by isotropic dry etching, and a second surface opposite the first surface. Furthermore, a through-hole is formed from the depression to the second surface by anisotropic dry etching. The depression and the through-hole are formed by using one resist mask. The depression has a hemispherical shape or a semi-elliptical spherical shape.