The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2012
Filed:
Nov. 21, 2008
Laurent A. Dellmann, Birmensdorf, CH;
Michel Despont, Au, CH;
Ute Drechsler, Rüschlikon, CH;
Roland M. Guerre, Horgen, CH;
Laurent A. Dellmann, Birmensdorf, CH;
Michel Despont, Au, CH;
Ute Drechsler, Rüschlikon, CH;
Roland M. Guerre, Horgen, CH;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for producing an integrated device. A source substrate is provided, the source substrate carrying one or more components to be attached to a receiver surface having a uneven topography. The source substrate includes a deformable layer on a surface on which the one or more components are carried. The source substrate is aligned such that said one or more components carried thereon are associated with contact areas of the receiver surface. The source substrate and the receiver surface are moved towards each other such that the one or more components are brought into contact with the contact areas wherein the deformable layer is at least partially deformed. The source substrate is removed such that the one or more of the components remain located on the contact areas of the receiver surface.