The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2012
Filed:
Nov. 20, 2009
Robert Hayes, Hong Kong, CN;
Romaric Massard, Eindhoven, NL;
Melanie Maria Hubertina Van DE Weijer-wagemans, Aarle-Rixtel, NL;
Robert Hayes, Hong Kong, CN;
Romaric Massard, Eindhoven, NL;
Melanie Maria Hubertina Van De Weijer-Wagemans, Aarle-Rixtel, NL;
Samsung LCD Netherlands R&D Center B.V., Eindhoven, NL;
Abstract
The present invention relates to reducing backflow in an electrowetting element for modifying a radiation beam characteristic. The electrowetting element comprises a first and a second fluid which are immiscible with each other and are switchable between a first configuration and a second configuration by application of a voltage across at least one of the first and second fluids. There is a tendency for backflow of the second fluid from the first configuration to the second configuration when the second fluid is switched to be provided in the first configuration. The electrowetting element comprises a backflow reducer arranged for reducing the backflow of the second fluid from the first configuration to the second configuration when the second fluid is switched to be provided in the first configuration.