The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2012
Filed:
Jun. 26, 2009
Applicants:
Hyun-chul Lee, Gyeonggi-do, KR;
Jung-taik Cheong, Gyeonggi-do, KR;
Gue-hong Song, Gyeonggi-do, KR;
Ky-hyun Han, Gyeonggi-do, KR;
Inventors:
Hyun-Chul Lee, Gyeonggi-do, KR;
Jung-Taik Cheong, Gyeonggi-do, KR;
Gue-Hong Song, Gyeonggi-do, KR;
Ky-Hyun Han, Gyeonggi-do, KR;
Assignee:
Hynix Semiconductor Inc., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/58 (2006.01); H01L 29/10 (2006.01); G02B 1/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
A reference wafer maintains laser accuracy and calibrates a camera and a laser of a semiconductor equipment. The reference wafer includes a first anti-reflection layer, an adhesive layer, a light absorption layer and a second anti-reflection layer that are stacked over a substrate, a light reflection layer formed over the second anti-reflection layer, and a protection layer formed over the light reflection layer.