The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2012
Filed:
Jul. 23, 2008
Moo Youn Park, Gwangmyeong-si, KR;
Jin Ha Kim, Seongnam-si, KR;
Soo Ryong Hwang, Gunpo-si, KR;
IL Hyung Jung, Seoul, KR;
Jong Ho Lee, Seoul, KR;
Moo Youn Park, Gwangmyeong-si, KR;
Jin Ha Kim, Seongnam-si, KR;
Soo Ryong Hwang, Gunpo-si, KR;
Il Hyung Jung, Seoul, KR;
Jong Ho Lee, Seoul, KR;
Samsung LED Co., Ltd, Suwon, KR;
Abstract
The present invention relates to an apparatus for forming a nano pattern capable of fabricating the uniform nano pattern at a low cost including a laser for generating a beam; a beam splitter for splitting the beam from the laser into two beams with the same intensity; variable mirrors for reflecting the two beams split by the beam splitter to a substrate; beam expansion units for expanding diameters of the beams by being positioned on paths of the two beams traveling toward the substrate; and a beam blocking unit, installed on an upper part of the substrate, transmitting only a specific region expanded through the beam expansion unit and blocking regions a remaining region, and a method for forming the nano pattern using the same.