The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2012
Filed:
Sep. 29, 2008
Jerome Mertz, Boston, MA (US);
Jerome Mertz, Boston, MA (US);
Trustees of Boston University, Boston, MA (US);
Abstract
A system for providing enhanced background rejection in thick tissue contains an aberrating element for introducing controllable extraneous spatial aberrations in an excitation beam path; at least one mirror capable of directing received laser pulses to the aberrating element; an objective; a beam scanner imaged onto a back aperture of the objective so that the beam scanner steers beam focus within the thick tissue; and a detector for recording signals produced by the tissue. An associated method comprises the steps of acquiring two-photon excited fluorescence of thick tissue without extraneous aberrations; introducing an extraneous aberration pattern in an excitation beam path; acquiring two-photon excited fluorescence of the thick tissue having the introduced extraneous aberration pattern; and subtracting the two-photon excited fluorescence with extraneous aberrations from the acquired standard two-photon excited fluorescence of the thick tissue without extraneous aberrations.