The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2012
Filed:
Dec. 06, 2005
Yong Hwan Kim, Daejeon, KR;
Eun Suk an, Daejeon, KR;
Jeong MI Kwon, Chungcheongbuk-do, KR;
Hyun Seong Jeong, Gwangju, KR;
Seung Yeong Park, Daejeon, KR;
Kee Hoon Won, Daejeon, KR;
Jae Kwang Song, Daejeon, KR;
Bong Keun Song, Daejeon, KR;
Jeong Yong Ryu, Daejeon, KR;
Yong Hwan Kim, Daejeon, KR;
Eun Suk An, Daejeon, KR;
Jeong Mi Kwon, Chungcheongbuk-do, KR;
Hyun Seong Jeong, Gwangju, KR;
Seung Yeong Park, Daejeon, KR;
Kee Hoon Won, Daejeon, KR;
Jae Kwang Song, Daejeon, KR;
Bong Keun Song, Daejeon, KR;
Jeong Yong Ryu, Daejeon, KR;
Korea Institute of Chemical Technology, Daejeon, KR;
Abstract
The present invention relates to a process for preparing phenolic polymers utilizingperoxidase. More particularly, the present invention relates to a process for preparing phenolic polymers by polymerizing phenolic monomers withperoxidase instead of using typical peroxidase which essentially requires the use of toxic formalin or peroxidase of plant origin which is very costly and easily deactivated by hydrogen peroxide in the polymerization of phenolic monomers, wherein the polymerization is conducted in the presence of a polar organic solvent under mild reaction conditions of atmospheric temperature and pressure to economically produce desired phenolic polymers having excellent water and chemical resistances with high yield.