The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2012
Filed:
Dec. 16, 2009
Jeon Kyu Lee, Icheon-si, KR;
Jeon Kyu Lee, Icheon-si, KR;
Hynix Semiconductor Inc., Icheon-si, KR;
Abstract
Disclosed is a method of fabricating an assist feature in a photomask, which includes: fabricating a design layout in which main patterns are arranged; setting a critical dimension (a) of assist features to be formed and a spacing (b) between the main pattern and the assist feature; setting a first expanded region extending from the main pattern by (a+b); setting a second expanded region extending from the main pattern by (b); and setting the assist features by removing the second expanded region from the first expanded region.
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