Aqueous highly acidic hard surface cleaning compositions

Abstract

Provided are highly aqueous liquid acidic hard surface cleaning compositions having a pH of about 3 or less which comprise: an acid constituent, preferably comprising a ternary acid system consisting formic acid, sulfamic acid and oxalic acid, optionally at least one or more further co-acids; at least one nonionic surfactant based on monobranched alkoxylated C10/C11-fatty alcohols; an organic solvent constituent which comprises at least one glycol ether solvent, preferably a glycol ether solvent which desirably mitigates or masks malodors of the acid constituent, especially when the acid constituent comprises formic acid; optionally a cosurfactant constituent, including one or more nonionic, cationic, amphoteric or zwitterionic surfactants but preferably one or more nonionic surfactants and excluding cationic, amphoteric or zwitterionic surfactants; optionally one or more further constituents selected coloring agents, fragrances and fragrance solubilizers, viscosity modifying agents including one or more thickeners, pH adjusting agents and pH buffers including organic and inorganic salts, optical brighteners, opacifying agents, hydrotropes, abrasives, and preservatives, as well as other optional constituents known to the art; and the balance, water, wherein water comprises at least 80% wt. of the composition.