The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 05, 2012

Filed:

Mar. 18, 2005
Applicants:

Futoshi Yamamoto, Tokyo, JP;

Junichiro Ichikawa, Tokyo, JP;

Satoshi Oikawa, Tokyo, JP;

Sunao Kurimura, Ibaraki, JP;

Kenji Kitamura, Ibaraki, JP;

Inventors:

Futoshi Yamamoto, Tokyo, JP;

Junichiro Ichikawa, Tokyo, JP;

Satoshi Oikawa, Tokyo, JP;

Sunao Kurimura, Ibaraki, JP;

Kenji Kitamura, Ibaraki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for forming a ferroelectric spontaneous polarization reversal in a desired region of a ferroelectric substrate, wherein thickness of the ferroelectric substrate in the desired region A of the ferroelectric substrate is thinner than in a region B outside the desired region of the substrate, comprising the step of applying a given voltage into the ferroelectric substrate by a liquid electrode method to thereby form a ferroelectric spontaneous polarization reversal in the desired region of the ferroelectric substrate.


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