The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 05, 2012

Filed:

Jun. 12, 2008
Applicants:

Tatsuya Tomura, Tokyo, JP;

Tsutomu Sato, Yokohama, JP;

Takeshi Miki, Tokyo, JP;

Mikiko Takada, Kawasaki, JP;

Masaomi Sasaki, Susono, JP;

Inventors:

Tatsuya Tomura, Tokyo, JP;

Tsutomu Sato, Yokohama, JP;

Takeshi Miki, Tokyo, JP;

Mikiko Takada, Kawasaki, JP;

Masaomi Sasaki, Susono, JP;

Assignee:

Ricoh Company, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 7/24 (2006.01); G09B 67/44 (2006.01); B22F 9/24 (2006.01); C09B 23/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A photosensitized composite material and a material, an element, a device, and the like, which employ the photosensitized composite material, are provided. In the photosensitized composite material, multiphoton absorption compounds are highly sensitized for practical use by utilizing an enhanced plasmon field. The photosensitized composite material has a structure where the multiphoton absorption compounds are linked to the surface of a fine metal particle through linking groups. The fine metal particle generates an enhanced surface plasmon field in resonance with a multiphoton excitation wavelength. The multiphoton absorption compounds have a molecular structure enabling multiphoton absorption. The photosensitized composite material is contained in or used for, for example, a three-dimensional memory material and a three-dimensional recording medium, an optical power limiting material and an optical power limiting element, a photocuring material and a stereolithography system, and a fluorescent material for a multiphoton fluorescence microscope and a multiphoton fluorescence microscope.


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