The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2012
Filed:
Feb. 19, 2008
Sesha Varadarajan, Lake Oswego, OR (US);
Edward Augustyniak, Tualatin, OR (US);
Jeffrey Benzing, Saratoga, CA (US);
Sesha Varadarajan, Lake Oswego, OR (US);
Edward Augustyniak, Tualatin, OR (US);
Jeffrey Benzing, Saratoga, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
A plasma-enhanced chemical vapor deposition (PECVD) process including plasma particle extraction is described. Charged particles suspended in discharge volume are moved together with a plasma and can then be flushed away. The particle extraction process reduces unwanted particles on the wafer after deposition and reduces total process time. In some embodiments, the process can involve powering an electrode in the process chamber located away from the wafer. This electrode can be powered up as the main deposition electrode is powered down.