The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2012
Filed:
Dec. 12, 2007
Chad A. Mirkin, Evanston, IL (US);
Peng Sun, Skokie, IL (US);
Yuhuang Wang, Silver Spring, MD (US);
Steven Lenhert, Karlsruhe, DE;
Chad A. Mirkin, Evanston, IL (US);
Peng Sun, Skokie, IL (US);
Yuhuang Wang, Silver Spring, MD (US);
Steven Lenhert, Karlsruhe, DE;
Northwestern University, Evanston, IL (US);
Karlsruhe Institute of Technology, Karlsruhe, DE;
Abstract
Massive parallel printing of structures and nanostructures, including lipids, at high speed with high resolution and high quality using two dimensional arrays comprising cantilevers and tip-based transfer of material to a surface. The invention provides a nanolithographic method comprising (1) providing a two-dimensional array of a plurality of cantilevers, wherein the array comprises a plurality of base rows, each base row comprising a plurality of cantilevers extending from the base row, wherein each of the cantilevers comprising tips at the cantilever end away from the base row; wherein the two dimensional array has a support; (2) providing a patterning composition, wherein the composition comprises one or more lipids; (3) providing a substrate; (4) coating the tips of the cantilevers with the patterning composition; and (5) depositing at least some of the patterning composition from the tips to the substrate surface.