The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2012
Filed:
May. 27, 2009
Stephen Y. Chou, Princeton, NJ (US);
Can Peng, Houston, TX (US);
Wendi LI, Princeton, NJ (US);
Shufeng Bai, Foster City, CA (US);
Stephen Y. Chou, Princeton, NJ (US);
Can Peng, Houston, TX (US);
Wendi Li, Princeton, NJ (US);
Shufeng Bai, Foster City, CA (US);
Other;
Abstract
This invention relates to the fabrication of large area nanoimprint molds having complex patterns with minimal or no use of direct-writing, such as electron beam lithography, ion, laser beam, or mechanical beam lithography. This can be accomplished by forming a pattern of simple nanoscale features and converting the simple features into more complex nanoscale features by a process comprising shadow deposition. The process may also include steps of uniform deposition, etching and smoothing depending on the shape of the complex features.