The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 29, 2012

Filed:

Mar. 07, 2007
Applicants:

Nevenka Dimirova, Pelham Manor, NY (US);

Yee Him Cheung, New York, NY (US);

Inventors:

Nevenka Dimirova, Pelham Manor, NY (US);

Yee Him Cheung, New York, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Systems and methods facilitate the location and/or identification of repetitive DNA patterns, such as CpG islands, Alu repeats, tandem repeats and various types of satellite repeats. These repetitive elements can be found within a chromosome, within a genome or across genomes of various species. The systems and methods apply image processing operators to find prominent features in the vertical and horizontal direction of the DNA spectrograms. The systems and methods for detecting and/or classifying repetitive DNA patterns include: (a) a comparative histogram method, (b) feature selection and classification using support vector machines and genetic algorithms, and (c) generation of a spectrovideo from a plurality of spectral images.


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