The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2012
Filed:
Jun. 02, 2010
Xiquan Cui, Pasadena, CA (US);
Xin Heng, Somerville, MA (US);
Changhuei Yang, Pasadena, CA (US);
Axel Scherer, Laguna Beach, CA (US);
Demetri Psaltis, Lausanne, CH;
Guoan Zheng, Pasadena, CA (US);
Xiquan Cui, Pasadena, CA (US);
Xin Heng, Somerville, MA (US);
Changhuei Yang, Pasadena, CA (US);
Axel Scherer, Laguna Beach, CA (US);
Demetri Psaltis, Lausanne, CH;
Guoan Zheng, Pasadena, CA (US);
California Institute of Technology, Pasadena, CA (US);
Abstract
Embodiments of the present invention relate to a surface wave enabled darkfield aperture structure comprising an aperture layer, a aperture in the aperture layer and a plurality of grooves around the aperture. The aperture layer has a first and second surface. The plurality of grooves is in the first surface. A surface wave propagates along at least the first surface. The plurality of grooves is configured to generate a darkfield at the aperture by modifying the surface wave to cancel out direct transmission of a uniform incident light field received by the aperture.