The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8188602 B1

PDF
Full Text
Expired
Date of Patent:
May. 29, 2012

Filed:

Jan. 24, 2003
Applicants:

Satoshi Otsuka, Kawasaki, JP;

Shun-ichi Fukuyama, Kawasaki, JP;

Inventors:

Satoshi Otsuka, Kawasaki, JP;

Shun-ichi Fukuyama, Kawasaki, JP;

Assignee:

Fujitsu Semiconductor Limited, Yokohama-Shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 51/46 (2006.01);
U.S. Cl.
CPC ...
Abstract

To provide a semiconductor device having copper wiring layers and organic insulating resin layers with less separation and its manufacture method. A semiconductor device has: a semiconductor substrate formed with a number of semiconductor elements; a first interlayer insulating film formed above the semiconductor substrate and having a first wiring recess; a first copper wiring embedded in the first wiring recess; a second interlayer insulating film having a second wiring recess, the second interlayer insulating film including a copper diffusion preventing layer formed on the first copper wiring and the first interlayer insulating film, an oxide film formed on the copper diffusion preventing layer, and an organic insulating resin layer formed on the oxide film; and a second copper wiring embedded in the second wiring recess.


Find Patent Forward Citations

Otsuka, Satoshi. (2012). Semiconductor device having multilevel copper wiring layers and its manufacture method (U.S. Patent No. 8188602). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8188602

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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