The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2012
Filed:
Sep. 17, 2010
Kazuya Shimizu, Ibaraki, JP;
Masayoshi Yamanaka, Okayama, JP;
Tatsuhiko Hayashibara, Okayama, JP;
Hideharu Iwasaki, Okayama, JP;
Kazuya Shimizu, Ibaraki, JP;
Masayoshi Yamanaka, Okayama, JP;
Tatsuhiko Hayashibara, Okayama, JP;
Hideharu Iwasaki, Okayama, JP;
Kuraray Co., Ltd., Kurashiki-shi, JP;
Abstract
Provided are an acrylate derivative useful as a raw material of a polymer compound for resist compositions capable of giving resist patterns which are excellent in lithographic performance and have a good shape, an intermediate thereof (alcohol derivative) and production processes for them. To be specific, it is an acrylate derivative represented by a formula shown below: (wherein Rrepresents a hydrogen atom, methyl or trifluoromethyl; R, R, R, R, R, Rand Reach represent independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms; Rand Reach represent independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms or an alkoxy group having 1 to 6 carbon atoms, or both of Rand Rare combined to represent an alkylene group having 1 to 3 carbon atoms, —O— or —S—; and Rrepresents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a cyclic hydrocarbon group having 3 to 10 carbon atoms).