The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2012
Filed:
Oct. 08, 2004
Applicants:
Rama R. Goruganthu, Austin, TX (US);
Michael R. Bruce, Austin, TX (US);
Inventors:
Rama R. Goruganthu, Austin, TX (US);
Michael R. Bruce, Austin, TX (US);
Assignee:
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2012.01); G02B 13/18 (2006.01);
U.S. Cl.
CPC ...
Abstract
Lithography using solid immersion lenses is disclosed. In one aspect, an apparatus is provided that includes a resist film that has a first side and a second and opposite side. One or more solid immersion lenses are positioned over the first side of the resist film. In another aspect, a method of manufacturing is provided that includes forming a resist film and exposing the resist film with radiation transmitted through one or more solid immersion lenses.