The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2012
Filed:
May. 08, 2008
Toshinori Miura, Yaizu, JP;
Toshinori Miura, Yaizu, JP;
Meidensha Corporation, Tokyo, JP;
Abstract
A resist removing devicefunctions to remove a resist from a substrate while preventing occurrence of popping phenomenon and at the same time attains reduction in cost of energy for the resist removing and has a simplified constitution. The resist removing deviceis equipped with a chamberfor containing therein a substrate(for example, a substrate having a high-doze ion implanted resist), and with a pressure below the atmospheric pressure, the chamberis fed with ozone gas, unsaturated hydrocarbons and water vapor. The ozone gas may be an ultra-high concentrated ozone gas that is produced by subjecting an ozone containing gas to a liquefaction-separation with the aid of a vapor pressure difference and then vaporizing the liquefied ozone. For cleaning the substratethus treated, it is preferable to use ultra-pure water. The chamberis equipped with a susceptorfor holding the substrate. The susceptoris heated to a temperature of 100° C. or below. An example of the means of heating the susceptor is a light source that emits infra-red rays.