The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2012
Filed:
Jan. 30, 2009
Dirk Thiele, Austin, TX (US);
Dirk Thiele, Austin, TX (US);
Fisher-Rosemount Systems, Inc., Round Rock, TX (US);
Abstract
An MPC adaptation and tuning technique integrates feedback control performance better than methods commonly used today in MPC type controllers, resulting in an MPC adaptation/tuning technique that performs better than traditional MPC techniques in the presence of process model mismatch. The MPC controller performance is enhanced by adding a controller adaptation/tuning unit to an MPC controller, which adaptation/tuning unit implements an optimization routine to determine the best or most optimal set of controller design and/or tuning parameters to use within the MPC controller during on-line process control in the presence of a specific amount of model mismatch or a range of model mismatch. The adaptation/tuning unit determines one or more MPC controller tuning and design parameters, including for example, an MPC form, penalty factors for either or both of an MPC controller and an observer and a controller model for use in the MPC controller, based on a previously determined process model and either a known or an expected process model mismatch or process model mismatch range. A closed loop adaptation cycle may be implemented by performing an autocorrelation analysis on the prediction error or the control error to determine when significant process model mismatch exists or to determine an increase or a decrease in process model mismatch over time.