The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2012
Filed:
May. 09, 2005
Yasuhiro Tanaka, Hyogo, JP;
Makoto Umetani, Osaka, JP;
Hiroshi Yamaguchi, Osaka, JP;
Motonobu Yoshikawa, Osaka, JP;
Katsuhiko Hayashi, Osaka, JP;
Yasuhiro Tanaka, Hyogo, JP;
Makoto Umetani, Osaka, JP;
Hiroshi Yamaguchi, Osaka, JP;
Motonobu Yoshikawa, Osaka, JP;
Katsuhiko Hayashi, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
The present invention relates to a structure comprising: a resin pattern (A)formed on a base materialand having structure units of a predetermined shape; and a resin pattern (B)formed on a surface of the resin pattern (A)and having microscopic structure units, of a predetermined shape, arranged at a period shorter than or equal to a wavelength range of a using light, and to a method for producing the structure, comprising the steps of: (i) forming a resin layeron the base materialand subjecting the resin layerto an exposure-development process so as to form the resin pattern (A); and (ii) subjecting a surface of the resin pattern (A)to an exposure-development process so as to form the resin pattern (B), wherein the steps (i) and (ii) are sequential.