The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2012
Filed:
Jan. 26, 2010
Sajan Marokkey, Wappingers Falls, NY (US);
Chandrasekhar Sarma, Poughkeepsie, NY (US);
Alois Gutmann, Poughkeepsie, NY (US);
Sajan Marokkey, Wappingers Falls, NY (US);
Chandrasekhar Sarma, Poughkeepsie, NY (US);
Alois Gutmann, Poughkeepsie, NY (US);
Infineon Technologies AG, Munich, DE;
Abstract
Mark and method for integrated circuit fabrication with polarized light lithography. A preferred embodiment comprises a first plurality of elements comprised of a first component type, wherein the first component type has a first polarization, and a second plurality of elements comprised of a second component type, wherein the second component type has a second polarization, wherein the first polarization and the second polarization are orthogonal, wherein adjacent elements are of different component types. The alignment marks can be used in an intensity based or a diffraction based alignment process.