The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2012
Filed:
Oct. 30, 2009
Keon Woo Lee, Daejeon, KR;
Raisa Kharbash, Daejeon, KR;
Chang Ho Cho, Anseong-si, KR;
Sung Hyun Kim, Daejeon, KR;
Sang Kyu Kwak, Daejeon, KR;
Dong Kung OH, Daejeon, KR;
Chang Soon Lee, Daejeon, KR;
Keon Woo Lee, Daejeon, KR;
Raisa Kharbash, Daejeon, KR;
Chang Ho Cho, Anseong-si, KR;
Sung Hyun Kim, Daejeon, KR;
Sang Kyu Kwak, Daejeon, KR;
Dong Kung Oh, Daejeon, KR;
Chang Soon Lee, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.