The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2012
Filed:
Oct. 30, 2009
Kosuke Tanaka, Tokyo, JP;
Daisuke Miyauchi, Tokyo, JP;
Takumi Yanagisawa, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
A method for producing a thin film magnetic head including a magnetoresistive effect element (MR element) that has a magnetic sensor multi-layered film with a polygonal shape such that a vertex angle faces an air bearing surface (ABS) and a tip of the vertex angle is cut when the magnetic sensor multi-layered film is viewed from an X-Y plane that is parallel to a plane of a lower shield electrode layer includes a step for stopping a lapping process by using a measurement point in which a resistance value is steeply increased while the lapping face is gradually approaching the vertex angle of polygonal shape by lapping from the ABS side. Therefore, an excellent effect in which an ultra narrow track width that exceeds limits of photolithography technology can be securely and constantly formed is obtained.