The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8181870 B1

PDF
Full Text
Expired
Date of Patent:
May. 22, 2012

Filed:

Jul. 29, 2008
Applicant:

Raphael F. Bov, Jr., Pittsford, NY (US);

Inventor:

Raphael F. Bov, Jr., Pittsford, NY (US);

Assignee:

Xerox Corporation, Norwalk, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A magnetic character recognition (MICR) encoding device has a treatment station that applies a chemical treatment to the blank region as the sheets pass along the sheet path that compensates for a fuser release agent that a marking station uses. If blank region was not treated, the fuser release agent might detrimentally affect the printing of the additional magnetic ink markings. In order to properly align the blank region with the treatment station, the embodiments herein include at least one read head that is positioned before the treatment station along the sheet path. A controller analyzes the signals from the read head to determine whether the magnetic ink markings are aligned with the treatment station.


Find Patent Forward Citations

Bov, Jr., Raphael. (2012). Self-aligning micr line treatment applicator (U.S. Patent No. 8181870). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8181870

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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