The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2012
Filed:
Dec. 28, 2009
Hyoung Soon Yune, Seoul, KR;
Joo Kyoung Song, Gyeonggi-do, KR;
Hak Yong Sim, Gyeonggi-do, KR;
Hynix Semiconductor Inc., Kyoungki-do, KR;
Abstract
A method for processing optical proximity correction is disclosed which eliminates a need for repeated implementation of experiments and result in a reducing the processing time as compared to trial and error. Furthermore, the method can realize an optimal insertion of the assist pattern by applying different conditions to specific layers. The method includes determining whether or not to insert an assist pattern around an outermost pattern. A shape of the assist pattern inserted around the outermost pattern is determined. The contrast of the outermost pattern is compared against a contrast of a cell array pattern. The contrast of the outermost pattern is repeated compared with the contrast of the cell array pattern under a defocus state.