The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2012
Filed:
Jul. 10, 2008
Taku Hirasawa, Kyoto, JP;
Jyunpei Matsuzaki, Osaka, JP;
Taku Hirasawa, Kyoto, JP;
Jyunpei Matsuzaki, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
Multiple imaging areas () are disposed in a one-to-one relationship with multiple optical lenses () disposed in a substantially coplanar alignment. A baffle wall () interposed between the multiple imaging areas is provided with means for diffusively reflecting incident light rays. Low frequency components are removed from the spatial frequencies of multiple images captured in the multiple imaging areas, whereupon the multiple images are compared to determine the amount of parallax and measure the distance to the object. This allows for preventing degradation in the accuracy of distance measurement when light rays emanating from a high-intensity object located outside of the field angle are reflected from the baffle wall and impinge on the imaging area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile