The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 2012

Filed:

Jun. 16, 2009
Applicants:

Hyun-jin Kim, Hwaseong-Si, KR;

Jae-hyun Kim, Seoul, KR;

Hyo-jung Roh, Hwaseong-Si, KR;

Man-ho Han, Hwaseong-Si, KR;

Dong-kyu Ju, Hwaseong-Si, KR;

Inventors:

Hyun-Jin Kim, Hwaseong-Si, KR;

Jae-Hyun Kim, Seoul, KR;

Hyo-Jung Roh, Hwaseong-Si, KR;

Man-Ho Han, Hwaseong-Si, KR;

Dong-Kyu Ju, Hwaseong-Si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); C08F 122/14 (2006.01); C08L 31/00 (2006.01); B05D 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polymer for forming an organic anti-reflective coating layer, which is soluble in alkali solutions so that an additional etching process of anti-reflective coating layer is not required, and a composition including the same are disclosed. The polymer for forming an organic anti-reflective coating layer has the following formula. Wherein, Ris a hydrogen atom (H) or a methyl group (—CH), Ris a sulfur atom (S) or an oxygen atom (O), Ris a group containing 1 to 20 carbon atoms and a terminal hydroxyl group, Ris an alkylene group or a cycloalkylene group, and if necessary, a hetero atom is contained therein, and a, b and c independently represent weight % of repeating units constituting the polymer, and are 1 to 98 weight %, 1 to 98 weight %, and 1 to 98 weight %, respectively.


Find Patent Forward Citations

Loading…