The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2012
Filed:
May. 23, 2011
Chang Ming Wu, New Taipei, TW;
Yi Nan Chen, Taipei, TW;
Hsien Wen Liu, Luzhu Township, TW;
Nanya Technology Corp., , TW;
Abstract
The present invention relates to a method for forming a recess array device structure in a semiconductor substrate. The method includes the steps of: providing a base material including a semiconductor substrate and a first material; forming a plurality of second recesses on the semiconductor substrate; forming a second material in the second recesses; forming a metal layer on the second material and the base material, wherein the metal layer includes a first portion and a second portion; removing the second portion to form a plurality of metal layer openings; to and etching the base material according to the metal layer openings so as to form a plurality of third recesses. Accordingly, the metal layer can overcome the non-selectivity issue during the etching process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile