The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2012
Filed:
Feb. 09, 2010
Alan T. Y. Cheng, Naperville, IL (US);
Ying Zhou, Naperville, IL (US);
Amitabh Gupta, Naperville, IL (US);
Balazs Hunek, Chicago, IL (US);
Nigel Grinter, Buffalo Grove, IL (US);
Alan T. Y. Cheng, Naperville, IL (US);
Ying Zhou, Naperville, IL (US);
Amitabh Gupta, Naperville, IL (US);
Balazs Hunek, Chicago, IL (US);
Nigel Grinter, Buffalo Grove, IL (US);
Praxair Technology, Inc., Danbury, CT (US);
Abstract
Methods for controlling the level of dissolved carbon dioxide and limiting osmolality in a mammalian cell culture process to enhance cell growth, viability and density, and increase biologic product concentration and yield are provided. Such control of the level of dissolved carbon dioxide and pH as well as the resulting ability to limit osmolality in a mammalian cell culture process is achieved by adopting alternative pH control strategies and COstripping techniques during a mammalian cell culture process. Such pH control techniques and carbon dioxide stripping occur without foam and with little or no damage to the mammalian cells.